Products > US Clean System > Dry Ultrasonic Cleaning System
Dry Ultrasonic Cleaning System
   Dry Ultrasonic Cleaning System
Features
  • 5um particle removal efficiency up to 98%
  • Maintenance-free, low loss, and the space is easy to configure
  • Fluid balanced design, the gas does not leak
  • Non-contact design, no worries about material injury
Summary

Suitable for the preceding processes of patch, exposure, etching, and inspection.
Effective removal of the particle on the substrate, and to enhance process yield of the substrate. 

 

 

 

Uniformity of the air supply to ensure cleaning performance more stable within the effective range and will not cause secondary pollution occurs.

 

 

Colocated with the equipment double-edged simultaneously cleaning, Reduce cost, Improve process’s productivity.

Collocation is succinct, small, and space-saving.
Effective removal of the particle on the substrate, and to enhance process yield of the substrate.

 

Specification
    Size(mm)     Standard:(L+140)*110(W)*125(H)
    Cleaner Head
    Effective length
    According to customer needs
    L:100mm~1,800mm
    ψD mm     With L size range change
    A、B

    According to the Environment of the machine, the length can   be  changed.