Products > Plasma Series > VACUUM PLASMA CLEANER
VACUUM PLASMA CLEANER
MCP-CA050   VACUUM PLASMA CLEANER
Features

 

.Eco design with high density plasma source, low air-consumed and low power rate, attaining cleanness in short time.
.Simple structure, even plasma, Arc free, easy maintenance and high machine reliability.
.Multi-layer placement in one batch, raising productivity.

 

 

Summary
    • ITO glass surface cleaning.
    • Electric component, photonic component, IC cleaning packaging.
    • Surface cleaning and modification before cleaning
    • Enhance surface hydrophilic and adhesiveness
    • Localized electron free, able to apply in biomedicine material processing.

Plasma tour / Operation screen

   

 
Treatment effect is real    

 

 

 

Specification
Machine Dimension 1100(L)x 1200(W)x 2100(H) mm
Operation Method PLC system control
Power Requirement 3ψ 220V 60Hz, <50A
GAS Oxygen, difference gases can be applied per manufacturing process, MFC control
GAS for Vacuum Breaking N2 or CDA, 5 kgf/cm², 200 L/min, Customizable
Cooling Water 3~6 kgf/cm²,>5 L/min,18~22℃
Processing Time per Batch According to setting of cleaning period